The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2016
Filed:
Feb. 10, 2012
Applicants:
Yuhao MA, Jiangsu, CN;
Peijun Xu, Jiangsu, CN;
Jieping Chen, Jiangsu, CN;
Philippe Leconte, Saint Fons, FR;
Ann Mu, Shanghai, CN;
Inventors:
Yuhao Ma, Jiangsu, CN;
Peijun Xu, Jiangsu, CN;
Jieping Chen, Jiangsu, CN;
Philippe Leconte, Saint Fons, FR;
Ann Mu, Shanghai, CN;
Assignee:
Rhodia Operations, Aubervilliers, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 253/30 (2006.01); C07C 213/02 (2006.01);
U.S. Cl.
CPC ...
C07C 253/30 (2013.01); C07C 213/02 (2013.01);
Abstract
A new process for the production of APMMEA (aminopropylmethylethanolamine) is proposed. This process comprises at least 2 steps in which MEAPN (monomethylethanolaminopropionitrile) is first produced from MMEA (monomethylethanol amine) and ACN (acrylonitrile) and then said MEAPN is hydrogenated to obtain the corresponding amine, the APMMEA compound. APMMEA may be then eventually purified by several known process, notably by distillation.