The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2016
Filed:
Oct. 10, 2007
Applicants:
Hong Yee Low, Singapore, SG;
Fengxiang Zhang, Singapore, SG;
Inventors:
Hong Yee Low, Singapore, SG;
Fengxiang Zhang, Singapore, SG;
Assignee:
Agency for Science, Technology and Research, Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/02 (2006.01); B05D 3/12 (2006.01); B05D 5/00 (2006.01); B05D 5/08 (2006.01); B05D 7/04 (2006.01);
U.S. Cl.
CPC ...
B29C 59/022 (2013.01); B05D 3/12 (2013.01); B05D 5/00 (2013.01); B05D 5/08 (2013.01); B05D 7/04 (2013.01); B29C 59/02 (2013.01); B29C 2059/023 (2013.01); Y10T 428/24479 (2015.01);
Abstract
A method of modifying the wetting properties of the surface of a substrate, the method comprising the step of applying a first mold having an imprint forming surface to said substrate to form a first imprint thereon, said imprint forming surface being chosen to modify the wetting properties of the substrate surface.
Quick Actions:
Low, Hong. (2016). Modification of surface wetting properties of a substrate (U.S. Patent No. 9427908). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9427908
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