The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2016
Filed:
Mar. 14, 2013
Asahi Glass Company, Limited, Tokyo, JP;
Takashi Nakano, Tokyo, JP;
Kuniko Okano, Tokyo, JP;
Naoko Shirota, Tokyo, JP;
Kimiaki Kashiwagi, Tokyo, JP;
Yoshitomi Morizawa, Tokyo, JP;
Yoshiki Hamatani, Tokyo, JP;
ASAHI GLASS COMPANY, LIMITED, Tokyo, JP;
Abstract
To provide a process for producing a charge retention medium, with which a coating film (precursor of a charge retention medium) containing a fluorinated copolymer having repeating units based on tetrafluoroethylene and repeating units based on ethylene can easily be formed on the surface of a substrate, even in a case where the surface of the substrate has a complicated shape. A process for producing a charge retention medium (electret), which comprises a step of applying a coating composition containing a fluorinated copolymer (A) having repeating units based on tetrafluoroethylene and repeating units based on ethylene, and an organic solvent (C), to a substrate (first substrate) to form a coating film.