The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2016
Filed:
Apr. 20, 2011
Keisuke Sagisaka, Tokyo, JP;
Yoshifumi Noguchi, Tokyo, JP;
Keisuke Sagisaka, Tokyo, JP;
Yoshifumi Noguchi, Tokyo, JP;
Ferrotec Corporation, Tokyo, JP;
Abstract
Provided are a plasma stream generation method, a plasma processing method, a plasma generation apparatus, and a plasma processing apparatus using same, which enable plasma processing with rotating plasma to be controllably performed with stability and thereby improved in quality. The frequencies in four quadrants Z-Zare set at 7, 15, 6, and 20 Hz, respectively. This frequency variability can realize different rotational velocity of plasma in the four-portion partitioned rotational angle regions. The rotational velocities of plasmas P, Pare greater than those of plasmas P, P. Thus, the rotating plasma, which rotates at a periodically varied rotational velocity as plasma P, plasma P, plasma P, and plasma Pin that order while traveling in a circular orbit C, can be used for irradiation therewith, thereby performing uniform film formation treatment in first quadrant Zto fourth quadrant Z