The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2016

Filed:

Apr. 27, 2015
Applicant:

Korea Research Institute of Standards and Science, Daejeon, KR;

Inventors:

Takashi Ogawa, Daejeon, KR;

Bok Lae Cho, Daejeon, KR;

Sang Jung Ahn, Daejeon, KR;

In Yong Park, Daejeon, KR;

Cheolsu Han, Suwon-si, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/05 (2006.01); H01J 49/44 (2006.01); H01J 37/12 (2006.01); G01N 23/225 (2006.01); H01J 37/21 (2006.01);
U.S. Cl.
CPC ...
H01J 37/05 (2013.01); G01N 23/2251 (2013.01); H01J 37/12 (2013.01); H01J 37/21 (2013.01); H01J 49/44 (2013.01); H01J 2237/057 (2013.01); H01J 2237/1516 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/24485 (2013.01);
Abstract

Disclosed herein are a monochromator and a charged particle beam apparatus including the same. The monochromator may include a first electrostatic lens configured to have a charged particle beam discharged by an emitter incident on the first electrostatic lens, refract a ray of the charged particle beam, and include a plurality of electrodes and a second electrostatic lens spaced apart from the first electrostatic lens at a specific interval and configured to have a central axis disposed identically with a central axis of the first electrostatic lens, have the charged particle beam output by the first electrostatic lens incident on the second electrostatic lens, refract the ray of the charged particle beam, and comprise a plurality of electrodes. Accordingly, there is an advantage in that a charged particle beam can have an excellent profile even after passing through the monochromator.


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