The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2016
Filed:
Feb. 19, 2010
Masanori Aniya, Tokyo, JP;
Yoshiaki Sonobe, Tokyo, JP;
Masanori Aniya, Tokyo, JP;
Yoshiaki Sonobe, Tokyo, JP;
WD Media (Singapore) Pte. Ltd, Singapore, SG;
Abstract
A method of manufacturing a perpendicular magnetic recording medium 100 that includes forming a magnetic recording layer 122 on a disk base 110, then forming a resist layer 130 on the magnetic recording layer, and a patterning step of processing the resist layer so as to vary the thickness of the resist layer partially, thereby forming a predetermined pattern having a recessed part and a projected part. Finally, the method includes implanting ions into a plurality of layers including the magnetic recording layer with the resist layer interposed. At the ion implanting step, (1) one or more of said plurality of layers to be implanted with ions is determined by selectively applying an energy amount to implant ions, and (2) a total amount of ions to be implanted into each of said one or more of said plurality of layers is determined by selectively applying said energy amount for a respective time period for said one or more of said plurality of layers.