The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2016
Filed:
Dec. 17, 2014
International Business Machines Corporation, Armonk, NY (US);
Stephen E. Greco, Lagrangeville, NY (US);
Rasit O. Topaloglu, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
In an approach to determine one or more exposure areas in a reticle field and associated lithography process parameters for the one or more exposure areas, a computer receives a semiconductor design and sends the semiconductor design to a design analysis program. Additionally, the computer receives data from the design analysis program. Furthermore, the computer determines the one or more exposure areas in the reticle field, and at least one lithography process parameter for each exposure area of the one or more exposure areas in the reticle field based, at least in part, on the data received from the design analysis program, the semiconductor design, and one or more clustering algorithms associated with the design analysis program.