The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2016

Filed:

Feb. 21, 2014
Applicant:

AU Optronics Corporation, Hsin-Chu, TW;

Inventors:

Chun-Hao Tu, Hsin-Chu, TW;

Ren-Hong Jhan, Hsin-Chu, TW;

Hao-Lun Hsieh, Hsin-Chu, TW;

Kuo-Sen Kung, Hsin-Chu, TW;

Ting-Chun Lin, Hsin-Chu, TW;

Jen-Pei Tseng, Hsin-Chu, TW;

Assignee:

AU OPTRONICS CORPORATION, Hsin-Chu, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01); G02F 1/15 (2006.01); G02F 1/155 (2006.01);
U.S. Cl.
CPC ...
G02F 1/15 (2013.01); C23C 14/351 (2013.01); G02F 1/155 (2013.01); G02F 1/1508 (2013.01); G02F 1/1523 (2013.01);
Abstract

A method for manufacturing a patterned layer includes the steps of: providing a substrate having a first surface and a second surface opposite to the first surface; providing a material source for supplying a plurality of charged particles, in which the first surface faces the material source; providing a magnetic element, in which the second surface is arranged between the magnetic element and the first surface; and depositing the charged particles on the first surface through using the magnetic element so as to form a patterned layer. A method for manufacturing an electrochromic device is disclosed as well.


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