The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2016

Filed:

Aug. 22, 2012
Applicants:

Andrew Myer, Greenwood, IN (US);

Chetan Ponnathpur, Columbus, IN (US);

John Heichelbech, Columbus, IN (US);

George Muntean, Columbus, IN (US);

Stephen Holl, Columbus, IN (US);

James F. Burke, Columbus, IN (US);

John Anthis, Columbus, IN (US);

Joydeep Chakrabarti, Columbus, IN (US);

Brandon Simmons, Columbus, IN (US);

Niklas Schmidt, Madison, WI (US);

Yogesh V. Birari, Pune, IN;

Inventors:

Andrew Myer, Greenwood, IN (US);

Chetan Ponnathpur, Columbus, IN (US);

John Heichelbech, Columbus, IN (US);

George Muntean, Columbus, IN (US);

Stephen Holl, Columbus, IN (US);

James F. Burke, Columbus, IN (US);

John Anthis, Columbus, IN (US);

Joydeep Chakrabarti, Columbus, IN (US);

Brandon Simmons, Columbus, IN (US);

Niklas Schmidt, Madison, WI (US);

Yogesh V. Birari, Pune, IN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F01N 3/20 (2006.01); F16K 11/10 (2006.01); F04B 43/02 (2006.01);
U.S. Cl.
CPC ...
F01N 3/208 (2013.01); F01N 3/2066 (2013.01); F04B 43/02 (2013.01); F16K 11/10 (2013.01); F01N 2610/00 (2013.01); F01N 2610/02 (2013.01); F01N 2610/146 (2013.01); Y02T 10/24 (2013.01); Y10T 137/0391 (2015.04); Y10T 137/0396 (2015.04); Y10T 137/7836 (2015.04); Y10T 137/86815 (2015.04); Y10T 137/87676 (2015.04); Y10T 137/87684 (2015.04);
Abstract

Apparatuses and methods for urea dosing of an exhaust after treatment system are disclosed. Exemplary apparatuses include a chamber configured to receive pressurized gas at a first inlet, receive urea solution at a second inlet, and provide a combined flow of pressurized gas and urea to an outlet, a flow passage extending from the first inlet to a seating surface, and a valve member configured to move between an open position in which the valve member is spaced apart from the seating surface and a closed position in which the valve member contacts the seating surface. As the valve member moves from the open position to the closed position the valve member contacts the seating surface at a first location and wipes an area of the seating surface extending from the first location in a direction toward the flow passage.


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