The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2016

Filed:

Aug. 18, 2011
Applicants:

Sung Keun Park, Daegu, KR;

Eun Ha Park, Gumi-si, KR;

Nam Ku Moon, Ulsan, KR;

Tae Hwan Son, Ulsan, KR;

Inventors:

Sung Keun Park, Daegu, KR;

Eun Ha Park, Gumi-si, KR;

Nam Ku Moon, Ulsan, KR;

Tae Hwan Son, Ulsan, KR;

Assignee:

KOLON PLASTICS, INC., Gimcheon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D01F 6/86 (2006.01); C08K 3/36 (2006.01); C08K 5/13 (2006.01); C08K 5/34 (2006.01); C08K 5/20 (2006.01);
U.S. Cl.
CPC ...
D01F 6/86 (2013.01); C08K 3/36 (2013.01); C08K 5/13 (2013.01); C08K 5/34 (2013.01); C08K 5/20 (2013.01); Y10T 428/249921 (2015.04);
Abstract

The present invention relates to a poly-ether-ester elastomer resin composition and elastic monofilaments prepared therefrom, and more specifically to a thermoplastic poly-ether-ester elastomer resin composition and elastic monofilaments prepared therefrom, wherein the thermoplastic poly-ether-ester elastomer resin composition is prepared from a poly-ether-ester block copolymer, a heat stabilizer, a UV absorber, a hindered amine light stabilizer, and porous silica, thereby ensuring excellent perceived quality, spinnability and weavability.


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