The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2016
Filed:
Jun. 09, 2015
Applicant:
Chi Mei Corporation, Tainan, TW;
Inventors:
Ming-Ju Wu, Tainan, TW;
Chun-An Shih, Tainan, TW;
Assignee:
CHI MEI CORPORATION, Tainan, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 2/50 (2006.01); C08F 2/46 (2006.01); C08G 61/04 (2006.01); C09D 135/06 (2006.01); C09D 4/06 (2006.01); C08F 220/18 (2006.01);
U.S. Cl.
CPC ...
C09D 135/06 (2013.01); C09D 4/06 (2013.01); C08F 220/18 (2013.01);
Abstract
The present invention relates to a photosensitive resin composition, a protective film and an element having the same. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), an ortho-naphthoquinone diazide sulfonic acid ester (B) and a solvent (C). The alkali-soluble resin (A) is copolymerized by an unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a1), a fluorene derivative having a double-bond group (a2) and an unsaturated compound having an acid-decomposable group (a3).