The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2016

Filed:

Aug. 19, 2014
Applicant:

Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;

Inventors:

Sung-choul Lee, Hwaseong-si, KR;

Choul-gue Park, Hwaseong-si, KR;

Ki-hong Jung, Yongin-si, KR;

Soo-young Kim, Yongin-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 21/00 (2006.01); B24B 9/06 (2006.01); B24B 37/02 (2012.01);
U.S. Cl.
CPC ...
B24B 21/002 (2013.01); B24B 9/065 (2013.01); B24B 37/02 (2013.01);
Abstract

A polishing apparatus including a chuck for supporting a wafer while exposing a peripheral portion of the wafer, a polishing head for polishing the peripheral portion of the wafer, and a polishing solution supplying assembly provided above the chuck and configured to spray a polishing solution on the wafer and to form a liquid curtain on the chuck to protect the wafer when the wafer is polished may be provided.


Find Patent Forward Citations

Lee, Sung-choul. (2016). Polishing apparatus (U.S. Patent No. 9421662). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9421662

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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