The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2016
Filed:
Mar. 22, 2011
Katsumi Kobayashi, Kanagawa, JP;
Keizo Kimura, Kanagawa, JP;
Katsumi Kobayashi, Kanagawa, JP;
Keizo Kimura, Kanagawa, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A method of producing a photoelectric conversion element, which contains an electrically conductive support, a photosensitive layer having porous semiconductor fine particles that have adsorbed a dye formed on the support, a charge transfer layer; and a counter electrode; containing the steps of: applying a dispersion liquid, in which the content of solids excluding semiconductor fine particles is 1% by mass or less based on the total amount of the dispersion liquid, on the support, to form a coating; heating the coating, to obtain porous semiconductor fine particles; and sensitizing the porous semiconductor fine particles by a dye having a structure represented by Formula (1):()()()·CI  Formula (1)wherein M represents a metal atom, LL, LL, and X each are a ligand, CI represents a counter ion, mrepresents an integer of 1 to 3, mand meach represent an integer of 0 to 2.