The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2016

Filed:

Mar. 18, 2013
Applicant:

Solexel, Inc., Milpitas, CA (US);

Inventors:

Virendra V. Rana, Los Gatos, CA (US);

JianJun Liang, Milpitas, CA (US);

Pranav Anbalagan, San Jose, CA (US);

Mehrdad M. Moslehi, Los Altos, CA (US);

Assignee:

Solexel, Inc., Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/068 (2012.01); H01L 31/18 (2006.01); H01L 31/0224 (2006.01); H01L 31/0236 (2006.01); H01L 31/0352 (2006.01); H01L 31/05 (2014.01); H01L 31/0747 (2012.01); H01L 31/056 (2014.01);
U.S. Cl.
CPC ...
H01L 31/18 (2013.01); H01L 31/02363 (2013.01); H01L 31/022441 (2013.01); H01L 31/035281 (2013.01); H01L 31/0516 (2013.01); H01L 31/0682 (2013.01); H01L 31/0747 (2013.01); H01L 31/1804 (2013.01); H01L 31/1884 (2013.01); H01L 31/1896 (2013.01); H01L 31/056 (2014.12); Y02E 10/547 (2013.01); Y02P 70/521 (2015.11);
Abstract

A method for making a back contact solar cell. Base isolation regions are formed in a crystalline silicon back contact solar cell substrate having a substrate thickness in the range of approximately 1 micron to 100 microns. Pulsed laser ablation of a substance on the crystalline silicon back contact solar cell substrate is performed to form base openings, wherein the substance is at least one of silicon oxide, silicon nitride, aluminum oxide, silicon oxynitride, or silicon carbide. Emitter regions are selectively doped and base regions are selectively doped. Contact openings are formed for the selectively doped base regions and the selectively doped emitter regions. Metallization is formed on the selectively doped base regions and the selectively doped emitter regions.


Find Patent Forward Citations

Loading…