The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2016
Filed:
Jan. 15, 2016
Inotera Memories, Inc., Taoyuan, TW;
INOTERA MEMORIES, INC., Taoyuan, TW;
Abstract
A method for forming a cell contact. A substrate having first and second protruding structures is prepared. An etch stop layer is deposited over the substrate. A sacrificial layer is deposited on the etch stop layer. The sacrificial layer is recessed. Spacers are formed on the top surface of the sacrificial layer. A portion of the sacrificial layer not covered by the spacers is etched away, thereby forming a recess. A gap filling material layer is deposited into the recess. An upper portion of the gap filling material layer and the spacers are removed to expose the top surface of the sacrificial layer. The sacrificial layer is removed to form contact holes. A punch etching process is performed to remove the etch stop layer from bottoms of the contact holes. The contact holes is filled up with a conductive material layer.