The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2016

Filed:

Oct. 04, 2011
Applicants:

David Murphy, Helsinki, FI;

Tuomas Vaittinen, Helsinki, FI;

André Tadeu Santos Fialho, Berlin, DE;

Inventors:

David Murphy, Helsinki, FI;

Tuomas Vaittinen, Helsinki, FI;

André Tadeu Santos Fialho, Berlin, DE;

Assignee:

HERE GLOBAL B.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 19/00 (2011.01);
U.S. Cl.
CPC ...
G06K 9/00671 (2013.01); G06T 19/006 (2013.01);
Abstract

Methods and apparatuses are provided for restricting overlay of an augmentation. A method may include evaluating a feature space representation of an image for presence of a predefined feature pattern. The method may further include recognizing, based at least in part on the evaluating, that the predefined feature pattern is present in the feature space representation of the image. The method may additionally include, in response to recognizing that the predefined feature pattern is present in the feature space representation of the image, restricting overlay of an augmentation on a portion of the image corresponding to the recognized predefined feature pattern. Corresponding apparatuses are also provided.


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