The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2016
Filed:
Oct. 26, 2012
Applicant:
Oerlikon Surface Solutions Ag, Trubbach, Trubbach, CH;
Inventors:
Siegfried Krassnitzer, Feldkirch, AT;
Markus Lechthaler, Feldkirch, AT;
Assignee:
OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON, Pfaffikon SZ, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01); H01J 37/34 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/35 (2013.01); C23C 14/345 (2013.01); C23C 14/3485 (2013.01); H01J 37/3467 (2013.01);
Abstract
The present invention relates to a method for the vapor deposition of PVD layer systems by means of sputtering on at least one substrate, wherein the layer system comprises at least a first layer, characterized in that, at least in one step of the method, a HiPIMS method is used with a power density of at least 250 W/Cm, wherein a pulse length with a duration of at least 5ms is used while a substrate bias is applied to the substrate.