The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2016
Filed:
Sep. 25, 2012
Cemecon Ag, Würselen, DE;
Lars Hultman, Linköping, SE;
Grzegorz Greczynski, Linköping, SE;
Werner Koelker, Herzogenrath, DE;
Oliver Lemmer, Aachen, DE;
Stephan Bolz, Aachen, DE;
CemeCon AG, Würselen, DE;
Abstract
A process and a device for coating a substrate () are described. In a vacuum chamber (), a first magnetron cathode () is provided with a sputtering target () of a first metal composition comprising predominantly aluminium. A second magnetron cathode () is provided with a sputtering target () of a second metal composition comprising at least 50 at-% of a second metal selected from groups IVA-VIA of the periodic table. In order to obtain coatings with improved properties, electrical power is supplied to the cathodes () such that the targets () are sputtered, where electrical power is supplied to the first cathode () as pulsed electrical power according to high power impulse magnetron sputtering with a first peak current density, and to the second cathode () with a second peak current density lower than the first peak current density. The substrate () is arranged within the vacuum chamber such that particles from the plasma deposit onto the substrate forming a coating.