The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2016
Filed:
Mar. 24, 2014
Applicant:
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Inventors:
Sang-Wook Sin, Yongin, KR;
Sun-Young Jung, Yongin, KR;
Il-Sang Lee, Yongin, KR;
Jin-Woo Park, Yongin, KR;
Dong-Jin Kim, Yongin, KR;
Assignee:
Samsung Display Co., Ltd., , KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 14/34 (2006.01); B29C 43/00 (2006.01); C23C 14/08 (2006.01); C23C 24/10 (2006.01); H01L 51/52 (2006.01); B29K 105/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); B29C 43/006 (2013.01); C23C 14/08 (2013.01); C23C 24/10 (2013.01); H01L 51/5237 (2013.01); B29K 2105/251 (2013.01);
Abstract
A method of fabricating a sputtering target is provided. The method includes preparing a first powder material, wherein the first powder material includes tin oxide; preparing a mixture by mixing the first powder material and a second powder material, wherein the second powder material includes carbon; and fabricating the sputtering target by compressing and sintering the mixture simultaneously in a reducing atmosphere.