The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2016
Filed:
Mar. 24, 2014
Dongjin Semichem Co., Ltd., Incheon, KR;
Jung-Youl Lee, Gyeonggi-do, KR;
Young Bae Lim, Gyeonggi-do, KR;
Jong-Won Kim, Gyeonggi-do, KR;
Jae Woo Lee, Gyeonggi-do, KR;
Jae Hyun Kim, Seoul, KR;
DONGJIN SEMICHEM CO., LTD., Incheon, KR;
Abstract
An under-layer composition of resist having superior thermal stability, etching resistance, gap-filling property and void-preventing property, and a method for forming pattern using the same are disclosed. The under-layer composition of resist comprises: an aromatic ring containing polymer having the repeating unit of the following Formula 1; a compound of the following Formula 4; and an organic solvent. in Formula 1, Ris a monocyclic or polycyclic aromatic hydrocarbon group having 5 to 20 carbon atoms, Rand Ris independently a monocyclic or polycyclic aromatic hydrocarbon group having 4 to 14 carbon atoms, a is an integer of 1 to 3, and b is an integer of 0 to 2. in Formula 4, n is an integer of 1 to 250.