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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9416220 B1

PDFFull Text
Date of Patent:
Aug. 16, 2016

Filed:

May. 16, 2013

Resin composition for optical stereolithography

Applicant:

Cmet, Inc., Yokohama-Shi, JP;

Inventors:

Nobuo Ogane, Yokohama, JP;

Yuya Daicho, Yokohama, JP;

Eiji Nakamoto, Yokohama, JP;

Chiharu Homma, Yokohama, JP;

Assignee:

CMET Inc., Yokohama-Shi, JP;

Attorney:

Burr & Brown, PLLC

Primary Examiner:

Michael J Feely

Int. Cl.
CPC ...
B29C 67/00 (2006.01); B29C 67/24 (2006.01); C08G 59/68 (2006.01); C08K 5/37 (2006.01); C08G 59/24 (2006.01); C08G 65/18 (2006.01); C08G 59/38 (2006.01); C09D 163/00 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); C08L 63/00 (2006.01);
U.S. Cl.
CPC ...
C08G 59/245 (2013.01); B29C 67/00 (2013.01); C08G 59/24 (2013.01); C08G 59/38 (2013.01); C08G 65/18 (2013.01); C09D 163/00 (2013.01); G03F 7/0037 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01);
Abstract

A resin composition for optical stereolithography including a cation-polymerizable organic compound (A), a radical polymerizable organic compound (B), a cationic polymerization initiator (C) and a radical polymerization initiator (D), wherein the cationic polymerization initiator (C) is an aromatic sulfonium compound (C-1) represented by the following general formula (C-1): wherein R, R, and Rrepresent a monovalent organic group, Rf represents a fluoroalkyl group, m is the same number as the cationic charge of the 'cation [S(R)(R)(R)]', and n is an integer in a range of 0 to 6. The resin composition also includes an aromatic thiol compound (E) represented by the following general formula (E):RSH)  (E)wherein, Rrepresents a mono- or di-valent aromatic hydrocarbon which may optionally have a substituent, and p is an integer of 1 or 2.

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