The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2016
Filed:
Jun. 12, 2012
Ralf Pruemmer, Geilenkirchen, DE;
Ralf Conrads, Kempen, DE;
Klaus Bergmann, Herzogenrath, DE;
Felix Kuepper, Aachen, DE;
Jeroen Jonkers, Berlin, DE;
Ralf Pruemmer, Geilenkirchen, DE;
Ralf Conrads, Kempen, DE;
Klaus Bergmann, Herzogenrath, DE;
Felix Kuepper, Aachen, DE;
Jeroen Jonkers, Berlin, DE;
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V., Munich, DE;
USHIO DENKI KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention relates to a method and device for generating optical radiation (), in particular EUV radiation or soft x-rays, by means of electrically operated discharges. A plasma () is ignited in a gaseous medium between at least two electrodes (), wherein said gaseous medium is produced at least partly from a liquid material (), which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beam(s) (). At least two consecutive pulses () are applied within a time interval of each electrical discharge onto said surface(s). The delay between and/or the pulse energy of said consecutive pulses is controlled to stabilize the position of an emission center of the plasma ().