The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2016

Filed:

Apr. 19, 2013
Applicant:

Koc Universitesi, Sariyer, Istanbul, TR;

Inventors:

Burhanettin Erdem Alaca, Istanbul, TR;

Yusuf Leblebici, Lutry, CH;

Ismail Yorulmaz, Istanbul, TR;

Yasin Kilinc, Ankara, TR;

Bekir Aksoy, Istanbul, TR;

Assignee:

Koc Universitesi, Istanbul, TR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03H 9/24 (2006.01); B82B 1/00 (2006.01); H03B 5/30 (2006.01); H03H 9/02 (2006.01); B82Y 15/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
H03H 9/2463 (2013.01); B82B 1/005 (2013.01); H03B 5/30 (2013.01); H03H 9/2405 (2013.01); B82Y 15/00 (2013.01); B82Y 40/00 (2013.01); H03H 2009/02291 (2013.01); Y10S 977/762 (2013.01); Y10S 977/888 (2013.01); Y10S 977/956 (2013.01);
Abstract

In the present invention, a nanomechanical resonator array (), which is suitable being used in an oscillator and production method of said nanomechanical resonator array are developed. Said resonator array () comprises at least two resonators (), which are in the size of nanometers, which are vertically arrayed and which are preferably in the form of nano-wire or nano-tube; at least one coupling membrane (), which mechanically couples said resonators () from their one ends, and at least one clamping element (), which supports mechanical coupling by clamping said coupling membrane (). Said resonator array () can be actuated and its displacements can be sensed. The present invention develops a predictive model of the frequency response of an oscillator comprising the said resonator array () for electrostatic actuation and capacitive readout. An oscillator comprised of multiple resonator arrays () with different frequency responses connected to a frequency manipulation circuitry can be used as well. For silicon-based systems, said production method comprises the steps of patterning two windows on device silicon layer exposing it to plasma etching using Bosch process; carrying out a further oxidation to form nanowires in an oxide envelop; depositing further sacrificial material. Actuation and readout electrode integration comprises steps of electrode material deposition; self-aligned mask material deposition, chemical mechanical polishing; electrode material etch; releasing nanowires by etching sacrificial material and oxide envelope. For non-silicon-based systems, said production method comprises the steps of structural and sacrificial material deposition; patterning and anisotropic etching of both materials; isotropic etching of sacrificial material.


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