The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2016

Filed:

Sep. 22, 2015
Applicant:

Lg Electronics Inc., Seoul, KR;

Inventors:

Juhong Yang, Seoul, KR;

Jinah Kim, Seoul, KR;

Jeongbeom Nam, Seoul, KR;

Dohwan Yang, Seoul, KR;

Indo Chung, Seoul, KR;

Ilhyoung Jung, Seoul, KR;

Hyungjin Kwon, Seoul, KR;

Assignee:

LG ELECTRONICS INC., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0236 (2006.01); H01L 31/068 (2012.01); H01L 31/0216 (2014.01); H01L 31/18 (2006.01); H01L 31/0368 (2006.01); H01L 31/0352 (2006.01);
U.S. Cl.
CPC ...
H01L 31/02168 (2013.01); H01L 31/02363 (2013.01); H01L 31/02366 (2013.01); H01L 31/03682 (2013.01); H01L 31/035272 (2013.01); H01L 31/068 (2013.01); H01L 31/182 (2013.01); Y02E 10/546 (2013.01); Y02E 10/547 (2013.01);
Abstract

A solar cell can include a substrate of a first conductive type; an emitter region of a second conductive type opposite the first conductive type and which forms a p-n junction along with the substrate; an anti-reflection layer positioned on the emitter region; a front electrode part electrically connected to the emitter region; and a back electrode part electrically connected to the substrate, wherein the substrate including a first area formed of single crystal silicon and a second area formed of polycrystalline silicon, wherein a thickness of the anti-reflection layer positioned on the first area is less than a thickness of the anti-reflection layer positioned on the second area, wherein a roughness of an incident surface of the substrate in the first area is different from a roughness of the incident surface of the substrate in the second area, and wherein the emitter region is entirely formed on the incident surface of the substrate.


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