The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2016

Filed:

Sep. 29, 2008
Applicants:

Robert L. Zwingman, Walnut, CA (US);

Marco Racanelli, Santa Ana, CA (US);

Inventors:

Robert L. Zwingman, Walnut, CA (US);

Marco Racanelli, Santa Ana, CA (US);

Assignee:

Newport Fab, LLC, Newport Beach, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/70 (2006.01); H01L 27/12 (2006.01); H01L 21/762 (2006.01); H01L 21/84 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1203 (2013.01); H01L 21/76264 (2013.01); H01L 21/84 (2013.01);
Abstract

A disclosed embodiment is a semiconductor on insulator (SOI) structure comprising a buried oxide layer over a bulk semiconductor layer, and a device layer over the buried oxide layer. At least one transistor is fabricated in the device layer, wherein a source/drain junction of the transistor does not contact the buried oxide layer, thereby causing the source/drain junction to have a source/drain junction capacitance. The SOI structure also comprises at least one trench extending through the device layer and contacting a top surface of the buried oxide layer, thereby electrically isolating the at least one transistor. In one embodiment the at least one trench is formed after fabrication of the at least one transistor and is filled with only dielectric. In one embodiment, one or more wells may be formed in the device layer. In one embodiment the bulk semiconductor layer has a high resistivity of typically about 1000 ohms-centimeter or greater.


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