The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2016

Filed:

Jul. 10, 2015
Applicants:

Dainichiseika Color & Chemicals Mfg. Co., Ltd., Tokyo, JP;

Ukima Chemicals & Color Mfg. Co., Ltd., Tokyo, JP;

Inventors:

Kazuyuki Hanada, Tokyo, JP;

Kazuya Kimura, Tokyo, JP;

Kazuaki Muto, Tokyo, JP;

Kenichi Takahashi, Tokyo, JP;

Manabu Uruno, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21F 9/16 (2006.01); G21F 9/30 (2006.01); B01J 20/26 (2006.01); G21F 9/12 (2006.01); G21F 9/28 (2006.01); C08G 18/50 (2006.01); C08G 18/61 (2006.01); C08G 18/66 (2006.01); C08G 18/76 (2006.01); C08L 75/04 (2006.01); C08K 3/34 (2006.01);
U.S. Cl.
CPC ...
G21F 9/167 (2013.01); B01J 20/26 (2013.01); C08G 18/5024 (2013.01); C08G 18/61 (2013.01); C08G 18/667 (2013.01); C08G 18/6637 (2013.01); C08G 18/7664 (2013.01); C08K 3/346 (2013.01); C08L 75/04 (2013.01); G21F 9/12 (2013.01); G21F 9/162 (2013.01); G21F 9/28 (2013.01); G21F 9/30 (2013.01); G21F 9/307 (2013.01);
Abstract

The present invention intends to provide a method for removing radioactive cesium, or radioactive iodine and radioactive cesium that is simple and low-cost, further does not require an energy source such as electricity, moreover can take in and stably immobilize the removed radioactive substances within a solid, and can reduce the volume of radioactive waste as necessary, and to provide a hydrophilic resin composition using for the method for removing radioactive cesium, or radioactive iodine and radioactive cesium, and the object of the present invention is achieved by using a hydrophilic resin composition containing: at least one hydrophilic resin selected from the group consisting of a hydrophilic polyurethane resin, a hydrophilic polyurea resin, and a hydrophilic polyurethane-polyurea resin each having at least a hydrophilic segment; and a clay mineral dispersed therein in a ratio of at least 1 to 180 mass parts relative to 100 mass parts of the hydrophilic resin.


Find Patent Forward Citations

Loading…