The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2016

Filed:

Dec. 15, 2009
Applicants:

Xiaoping Bian, Saratoga, CA (US);

Jack Jyh-kau Chang, Fremont, CA (US);

Mark F. Mercado, Morgan Hill, CA (US);

Mohammad T. Mirzamaani, San Jose, CA (US);

Kai Tang, San Jose, CA (US);

Inventors:

Xiaoping Bian, Saratoga, CA (US);

Jack Jyh-Kau Chang, Fremont, CA (US);

Mark F. Mercado, Morgan Hill, CA (US);

Mohammad T. Mirzamaani, San Jose, CA (US);

Kai Tang, San Jose, CA (US);

Assignee:

HGST Netherlands B.V., Amsterdam, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/66 (2006.01); G11B 5/84 (2006.01); C23C 14/06 (2006.01); C23C 14/34 (2006.01); G11B 5/73 (2006.01); G11B 5/851 (2006.01);
U.S. Cl.
CPC ...
G11B 5/8404 (2013.01); C23C 14/0688 (2013.01); C23C 14/3414 (2013.01); G11B 5/7325 (2013.01); G11B 5/851 (2013.01);
Abstract

A magnetic storage medium according to one embodiment includes a substrate; an onset layer formed above the substrate, the onset layer comprising ruthenium and titanium oxide; and a magnetic oxide layer formed directly on the onset layer. A method according to one embodiment includes sputtering using a target of ruthenium and titanium oxide for forming an onset layer above a substrate, the onset layer comprising ruthenium and titanium oxide; and forming a magnetic oxide layer directly on the onset layer. Additional systems and methods are also presented.


Find Patent Forward Citations

Loading…