The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2016

Filed:

Jan. 29, 2015
Applicant:

Qualcomm Incorporated, San Diego, CA (US);

Inventors:

Youngmin Park, Vienna, AT;

Daniel Wagner, Vienna, AT;

Assignee:

QUALCOMM Incorporated, San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/46 (2006.01); G06T 7/00 (2006.01); G06T 7/60 (2006.01);
U.S. Cl.
CPC ...
G06K 9/46 (2013.01); G06K 9/00624 (2013.01); G06T 7/0051 (2013.01); G06T 7/60 (2013.01); G06K 2009/4666 (2013.01); G06T 2207/20021 (2013.01);
Abstract

Disclosed are a system, apparatus, and method for performing occlusion handling for simultaneous localization and mapping. Occluded map points may be detected according to a depth-mask created according to an image keyframe. Dividing a scene into sections may optimize the depth-mask. Size of depth-mask points may be adjusted according to intensity. Visibility may be verified with an optimized subset of possible map points. Visibility may be propagated to nearby points in response to determining an initial visibility of a first point's surrounding image patch. Visibility may also be organized and optimized according to a grid.


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