The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2016

Filed:

Apr. 29, 2015
Applicant:

Nikon Corporation, Tokyo, JP;

Inventor:

Hideaki Hara, Kumagaya, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01); G03B 27/42 (2013.01); G03F 7/709 (2013.01); G03F 7/70325 (2013.01); G03F 7/2041 (2013.01);
Abstract

A liquid immersion exposure apparatus includes a projection system having a last optical element, a first member having a liquid supply port, a second member having a liquid recovery port, and a driving system which electromagnetically moves the first member, the second member, or both of the first and second members. A substrate is moved below and relative to the last optical element, the first member and the second member. A liquid supply from the liquid supply port and a liquid recovery from the liquid recovery port are performed to form a liquid immersion area on a portion of an upper surface of the substrate. The substrate is exposed with a beam through liquid in the liquid immersion area.


Find Patent Forward Citations

Loading…