The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2016

Filed:

Jun. 12, 2015
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Seong-eun Chung, Seoul, KR;

Tae-bae Kim, Hwaseong-si, KR;

Il-yong Jung, Yongin-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G03F 7/40 (2006.01); C09K 13/00 (2006.01); G03F 7/004 (2006.01); G03F 7/09 (2006.01); G03F 7/00 (2006.01); G03F 7/095 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133528 (2013.01); G03F 7/40 (2013.01); C09K 13/00 (2013.01); G02F 2001/133548 (2013.01); G03F 7/0035 (2013.01); G03F 7/0041 (2013.01); G03F 7/094 (2013.01); G03F 7/095 (2013.01);
Abstract

A method of manufacturing a linear grid for a display panel, the method including: applying a material layer for the linear grid to a substrate; laminating a negative photoresist layer having a pattern of the linear grid to a target area within an entire area of the material layer; laminating a positive photoresist layer to the entire area of the material layer; covering, with a mask for blocking ultraviolet light, areas within the entire area not including the target area, and emitting the ultraviolet light; etching the material layer according to the negative photoresist layer exposed by the ultraviolet light; and forming the pattern of the linear grid on the material layer by removing the negative photoresist layer and the positive photoresist layer from the entire area.


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