The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2016
Filed:
Sep. 04, 2012
Theodorus G. M. Oosterlaken, Almere, NL;
Radko Bankras, Almere, NL;
Theodorus G. M. Oosterlaken, Almere, NL;
Radko Bankras, Almere, NL;
ASM IP HOLDING B.V., Almere, NL;
Abstract
A semiconductor processing apparatus is described. The semiconductor processing apparatus includes a gas supply system. The gas supply system has at least one gas supply unit including a process gas source, a gas distribution manifold having an annular gas distribution conduit provided with an inlet and valved outlets; and a gas supply conduit fluidly connecting the process gas source to the inlet of the gas distribution manifold. The semiconductor processing apparatus also includes a plurality of reactors, each fluidly connected to a respective valved outlet of the gas distribution manifold, such that process gas from the process gas source of the at least one gas supply unit is selectively suppliable to a respective reactor via the gas supply conduit, the gas distribution manifold, and a respective valved outlet. A method of providing a plurality of reactors with process gas is also described.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile