The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2016
Filed:
Apr. 26, 2013
Korea Institute of Science and Technology, Seoul, KR;
Han-Ik Joh, Seoul, KR;
Su Young Son, Busan, KR;
Sung Ho Lee, Gyeonggi-do, KR;
Tae-Wook Kim, Gyeonggi-do, KR;
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY, Seoul, KR;
Abstract
The present disclosure relates to a polymer-based large-area carbon nanomesh and a method for preparing same. More particularly, the present disclosure provides a method for preparing a carbon nanomesh, including: preparing a polymer nanofilm by coating a solution of a block copolymer or a polymer mixture thereof on a substrate; stabilizing the polymer nanofilm by annealing such that the polymer nanofilm is phase-separated, a pore-forming polymer is removed and, at the same time, a nanomesh-forming polymer forms a stabilized porous polymer nanomesh; and carbonizing the stabilized porous polymer nanomesh by annealing at high temperature to prepare a carbon nanomesh. Using phase separation and cyclization of a polymer, a large-area carbon nanomesh with superior activity can be prepared simply with high reproducibility in large scale.