The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2016
Filed:
Dec. 20, 2011
Shinji Murai, Sagamihara, JP;
Yukishige Maezawa, Hachioji, JP;
Yasuhiro Kato, Kawasaki, JP;
Takehiko Muramatsu, Yokohama, JP;
Satoshi Saito, Yamato, JP;
Hiroko Watando, Tokyo, JP;
Naomi Shida, Tokyo, JP;
Reiko Yoshimura, Kawasaki, JP;
Takashi Kuboki, Tokyo, JP;
Shinji Murai, Sagamihara, JP;
Yukishige Maezawa, Hachioji, JP;
Yasuhiro Kato, Kawasaki, JP;
Takehiko Muramatsu, Yokohama, JP;
Satoshi Saito, Yamato, JP;
Hiroko Watando, Tokyo, JP;
Naomi Shida, Tokyo, JP;
Reiko Yoshimura, Kawasaki, JP;
Takashi Kuboki, Tokyo, JP;
KABUSHIKI KAISHA TOSHIBA, Tokyo, JP;
Abstract
An acid gas absorbent of which recovery amount of acid gas such as carbon dioxide is high, and an acid gas removal device and an acid gas removal method using the acid gas absorbent are provided. The acid gas absorbent of the embodiment comprising at least one type of tertiary amine compound represented by the following general formula (1). (In the above-stated formula (1), either one of the R, Rrepresents a substituted or non-substituted alkyl group of which carbon number is 2 to 5, and the other one represents a substituted or non-substituted alkyl group of which carbon number is 1 to 5. The Rrepresents a methyl group or an ethyl group, and the Rrepresents a hydroxyalkyl group. The R, Rmay either be the same or different, and they may be coupled to form a cyclic structure.)