The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2016
Filed:
Nov. 04, 2014
Applicant:
Lg Display Co., Ltd., Seoul, KR;
Inventors:
Assignee:
LG DISPLAY CO., LTD., Seoul, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H05K 1/02 (2006.01); H05K 1/16 (2006.01); H01L 29/417 (2006.01); H01L 29/423 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 27/124 (2013.01); H01L 27/1225 (2013.01); H01L 27/1244 (2013.01); H01L 29/41733 (2013.01); H01L 29/42384 (2013.01); H01L 29/78603 (2013.01); H01L 29/78696 (2013.01); H05K 1/028 (2013.01); H05K 1/16 (2013.01); H05K 1/0283 (2013.01); H05K 2201/0175 (2013.01); H05K 2201/0179 (2013.01); H05K 2201/0317 (2013.01); H05K 2201/051 (2013.01); H05K 2201/09227 (2013.01); H05K 2201/09263 (2013.01); H05K 2201/09272 (2013.01); H05K 2201/09281 (2013.01); H05K 2201/10128 (2013.01); H05K 2201/10166 (2013.01);
Abstract
Provided is a configuration for a semiconductor layer and a line for reducing the segment length of the semiconductor layer with respect to the bending direction of the flexible substrate. Such a configuration reduces the probability of cracks occurring in the semiconductor layer of the thin-film transistor, thereby improving the stability and durability of the thin-film transistor employed in a curved or a flexible display device. The configuration includes a thin-film transistor (TF) on the flexible substrate. The TFT includes the semiconductor layer extending obliquely with respect to the direction of the line.