The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2016
Filed:
Dec. 21, 2015
Imec Vzw, Leuven, BE;
Katholieke Universiteit Leuven, Ku Leuven R&d, Leuven, BE;
Efrain Altamirano Sanchez, Kessel-Lo, BE;
Farrukh Qayyum Yasin, Leuven, BE;
Raven Demeyer, Brugge, BE;
IMEC VZW, Leuven, BE;
Katholieke Universiteit Leuven, KU LEUVEN R&D, Leuven, BE;
Abstract
A method for lithographic patterning of a substrate is described. The method comprises obtaining a substrate to be patterned. It further comprises subsequently performing at least twice the following cycle: applying a lithographical patterning process of a thermally shrinkable metal-oxide layer for forming a metal-oxide pattern, and thermally shrinking the metal-oxide pattern. The different metal oxide patterns formed during the at least two cycles are positioned in proximity to each other such that the shrunk metal-oxide patterns form together an overall pattern to be transferred to the substrate. After performing the cycle at least twice, the overall pattern is transferred to the substrate.