The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2016
Filed:
Jul. 03, 2013
Applicant:
Industry-academic Cooperation Foundation, Yonsei University, Seoul, KR;
Inventors:
Eun Kyoung Kim, Seoul, KR;
Jong Hak Kim, Seoul, KR;
Jeong Hun Kim, Seoul, KR;
Jong Kwan Koh, Seoul, KR;
Jong Beom Na, Seoul, KR;
Chi Hyun Park, Suwon-si, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01G 9/20 (2006.01); H01L 29/78 (2006.01); H01G 9/00 (2006.01); H01L 51/05 (2006.01);
U.S. Cl.
CPC ...
H01G 9/2022 (2013.01); H01G 9/0029 (2013.01); H01G 9/204 (2013.01); H01G 9/2031 (2013.01); H01L 29/78 (2013.01); H01L 51/0508 (2013.01); Y02E 10/542 (2013.01); Y02P 70/521 (2015.11);
Abstract
Provided are a method for patterning a mesoporous inorganic oxide film, the method including a step of forming a mesoporous inorganic oxide film using a composition containing inorganic oxide particles; and a step of forming a pattern on the mesoporous inorganic oxide film using an elastic stamp for pattern formation, and then calcining the mesoporous inorganic oxide, and an electronic device including a mesoporous inorganic oxide film that has been patterned by the patterning method.