The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2016

Filed:

Sep. 30, 2013
Applicant:

Nitto Denko Corporation, Ibaraki-shi, Osaka, JP;

Inventors:

Mari Tanabe, Ibaraki, JP;

Hidehiko Andou, Ibaraki, JP;

Hideo Sugawara, Ibaraki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 33/00 (2006.01); H01B 13/00 (2006.01); G06F 3/041 (2006.01);
U.S. Cl.
CPC ...
H01B 13/0036 (2013.01); G06F 3/041 (2013.01); G06F 2203/04103 (2013.01);
Abstract

A method of manufacturing a transparent conductive film has the steps of: preparing a laminated body in which a transparent conductive layer that is not patterned is formed on a flexible transparent base, removing a part of the transparent conductive layer to form the pattern forming part having the transparent conductive layer on the flexible transparent base and the pattern opening part not having the transparent conductive layer on the flexible transparent base, and heating the laminated body in which the transparent conductive layer is patterned. The absolute value of the difference H−Hof the dimensional change rate Hof the pattern forming part and the dimensional change rate Hof the pattern opening part in the heat treatment step is preferably less than 0.03%.


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