The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2016

Filed:

Mar. 15, 2012
Applicants:

Liyang Pan, Beijing, CN;

Chen Tang, Beijing, CN;

Inventors:

Liyang Pan, Beijing, CN;

Chen Tang, Beijing, CN;

Assignee:

Tsinghua University, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 13/00 (2006.01); G06F 12/02 (2006.01);
U.S. Cl.
CPC ...
G06F 12/0246 (2013.01); G06F 2212/7211 (2013.01);
Abstract

The present invention discloses a wear leveling method; the method determines a pool mask for each physical block based on an erase number of each physical block. For different erase numbers, masks of the physical blocks are determined as cool pool mask CPM, normal pool mask NPM or hot pool mask HPM. When the pool mask of one physical block is changed from NPM to HPM, data of any physical block of which the pool mask is CPM is copied to the physical block of which the pool mask is HPM, and the physical block of which the pool mask is CPM is recycled as a garbage block. The present invention discloses a wear leveling apparatus, the method and apparatus can reduce additional wear caused by the wear leveling.


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