The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2016
Filed:
Apr. 18, 2011
Jeffrey A. Rock, Fairport, NY (US);
Gerald W. Fly, Geneseo, NY (US);
Yeh-hung Lai, Webster, NY (US);
Keith E. Newman, Athens, PA (US);
Alan J. Jacobsen, Woodland Hills, CA (US);
William B. Carter, Calabasas, CA (US);
Peter D. Brewer, Westlake Village, CA (US);
Hung D. Nguyen, Los Angeles, CA (US);
Joanna A. Kolodziejska, Glendale, CA (US);
Jeffrey A. Rock, Fairport, NY (US);
Gerald W. Fly, Geneseo, NY (US);
Yeh-Hung Lai, Webster, NY (US);
Keith E. Newman, Athens, PA (US);
Alan J. Jacobsen, Woodland Hills, CA (US);
William B. Carter, Calabasas, CA (US);
Peter D. Brewer, Westlake Village, CA (US);
Hung D. Nguyen, Los Angeles, CA (US);
Joanna A. Kolodziejska, Glendale, CA (US);
GM Global Technology Operations LLC, Detroit, MI (US);
Abstract
A method for fabricating a radiation-cured structure is provided. The method includes the steps of providing a first radiation-sensitive material and a second radiation-sensitive material adjacent the first radiation-sensitive material. The first radiation-sensitive material has a first sensitivity. The second radiation-sensitive material has the first sensitivity and a second sensitivity different from the first sensitivity. At least one mask is placed between at least one radiation source and the first and second radiation-sensitive materials. The mask has a plurality of substantially radiation-transparent apertures. The first and second radiation-sensitive materials are then exposed to a plurality of radiation beams through the radiation-transparent apertures in the mask to form a first construct in the first radiation-sensitive material and a second construct in the second radiation-sensitive material. The first construct and the second construct cooperate to form the radiation-cured structure.