logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9404179 B1

PDFFull Text
Date of Patent:
Aug. 02, 2016

Filed:

Feb. 18, 2013

Chemical vapor deposition process for depositing a silica coating on a glass substrate

Applicant:

Pilkington Group Limited, Lathom, GB;

Inventors:

Douglas Martin Nelson, Curtice, OH (US);

Michael Martin Radtke, Peru, IL (US);

Steven Edward Phillips, Ottawa, IL (US);

Assignee:

PILKINGTON GROUP LIMITED, Lathom, GB;

Attorney:

Marshall & Melhorn, LLC

Primary Examiner:

Michael Wieczorek

Assistant Examiner:

Michael G Miller

Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/24 (2006.01); B05D 5/06 (2006.01); C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 16/42 (2006.01); C03C 17/245 (2006.01); C03C 17/34 (2006.01);
U.S. Cl.
CPC ...
C23C 16/455 (2013.01); C03C 17/245 (2013.01); C03C 17/3417 (2013.01); C23C 16/401 (2013.01); C23C 16/42 (2013.01); C03C 2217/213 (2013.01); C03C 2217/241 (2013.01); C03C 2218/1525 (2013.01);
Abstract

A CVD process for depositing a silica coating is provided. The process includes providing a glass substrate. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger such as ethylene or propylene. The gaseous mixture is directed toward and along the glass substrate and is reacted over the glass substrate to form the silica coating thereon.

Find Patent Forward Citations

Nelson, Douglas. (2016). Chemical vapor deposition process for depositing a silica coating on a glass substrate (U.S. Patent No. 9404179). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9404179

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…