The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2016

Filed:

Aug. 24, 2012
Applicants:

Kenichiro Hiwatari, Tokyo, JP;

Atsuo Tomita, Tokyo, JP;

Tomoaki Saiki, Tokyo, JP;

Kiyoshi Murata, Tokyo, JP;

Inventors:

Kenichiro Hiwatari, Tokyo, JP;

Atsuo Tomita, Tokyo, JP;

Tomoaki Saiki, Tokyo, JP;

Kiyoshi Murata, Tokyo, JP;

Assignee:

ADEKA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 125/18 (2006.01); C08F 112/34 (2006.01); C08F 228/04 (2006.01); C08K 7/18 (2006.01); C08F 12/22 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
C08F 112/34 (2013.01); C08F 12/22 (2013.01); C08F 228/04 (2013.01); C08K 7/18 (2013.01); C09D 125/18 (2013.01); H01L 29/1608 (2013.01); H01L 2924/0002 (2013.01);
Abstract

Provided are: a curable composition from which a cured article having excellent molding processability and high heat resistance as well as such a high Tg that it can be used as a molding resin for a SiC power semiconductor can be obtained; and a cured article thereof. The curable composition comprises: 100 parts by mass of a compound having at least two partial structures represented by the following Formula (1) in the molecule as a component (A); 0.5 to 3 parts by mass of a thermal radical generator as a component (B); and 0 to 50 parts by mass of other radical-reactive compound as a component (C):


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