The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2016
Filed:
Sep. 30, 2014
Lg Chem, Ltd., Seoul, KR;
Dong Kwon Lee, Daejeon, KR;
LG CHEM, LTD., Seoul, KR;
Abstract
Disclosed are an apparatus for mass polymerization of a vinyl chloride resin which may suppress generation of abnormal products (fine-particle products, oversize-particle products, lumpy products due to coagulation, etc.) and a vinyl chloride resin, which causes formation of a poor sphere, and may enhance quality and processability of a vinyl chloride resin, by addressing the problem that an average distance between resin particles is decreased as polymerization proceeds, and thus, microparticles are generated due to excessive coagulation or friction between particles, and a method of mass-polymerizing the vinyl chloride resin. The method comprises additionally inputting a monomer to a reactor in which a monomer and an initiator are contained when a ratio of the monomer converted to a polymer is 30% to 70%.