The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2016
Filed:
Sep. 23, 2011
Applicants:
Ryujiro Nagasaka, Nagoya, JP;
Tatsuya Hishiki, Nagoya, JP;
Ichiro Wada, Kariya, JP;
Inventors:
Assignee:
NGK Insulators, Ltd., Nagoya, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 71/02 (2006.01); B01D 67/00 (2006.01); B01D 69/12 (2006.01);
U.S. Cl.
CPC ...
B01D 71/027 (2013.01); B01D 67/0046 (2013.01); B01D 67/0095 (2013.01); B01D 69/12 (2013.01); B01D 2323/08 (2013.01);
Abstract
A simple method of manufacturing a silica membrane which has high separation performance and high permeation flux is provided. The method is a method for manufacturing a silica membrane by depositing a silica sol on a porous substrate, drying the silica sol by air blowing which has a dew point of -70 to 0° C., and then firing the same thereafter to produce the silica membrane. Further, the silica sol is preferably dried by air blowing at an air velocity of 5 to 20 m/sec.