The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 26, 2016

Filed:

Apr. 30, 2014
Applicant:

Avago Technologies General Ip (Singapore) Pte. Ltd., Singapore, SG;

Inventors:

Qiang Zou, Fort Collins, CO (US);

Chris Feng, Fort Collins, CO (US);

Phil Nikkel, Loveland, CO (US);

John Choy, Westminster, CO (US);

Alexandre Augusto Shirakawa, San Jose, CA (US);

Tina L. Lamers, Fort Collins, CO (US);

Sook Ching Chang, San Jose, CA (US);

Dariusz Burak, Fort Collins, CO (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H03H 9/02 (2006.01); H03H 3/013 (2006.01); H03H 9/17 (2006.01); H03H 9/13 (2006.01);
U.S. Cl.
CPC ...
H03H 9/02102 (2013.01); H03H 3/013 (2013.01); H03H 9/02086 (2013.01); H03H 9/173 (2013.01); H03H 9/132 (2013.01);
Abstract

A bulk acoustic wave (BAW) resonator device includes a substrate defining a cavity, a bottom electrode formed over the substrate and at least a portion of the cavity, a piezoelectric layer formed on the bottom electrode, and a top electrode formed on the piezoelectric layer. An air-wing and an air-bridge are formed between the piezoelectric layer and the top electrode, the air-wing having an inner edge that defines an outer boundary of an active region of the BAW resonator device. The BAW resonator device further includes a temperature compensation feature having positive temperature coefficient for offsetting at least a portion of a negative temperature coefficient of the piezoelectric layer. The temperature compensation feature extends outside the active region by a predetermined length.


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