The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2016
Filed:
Nov. 11, 2014
Applicant:
Regents of the University of Minnesota, Minneapolis, MN (US);
Inventors:
Ankit Mahajan, Minneapolis, MN (US);
Carl Daniel Frisbie, Mahtomedi, MN (US);
Lorraine F. Francis, Minnetonka, MN (US);
Assignee:
REGENTS OF THE UNIVERSITY OF MINNESOTA, Minneapolis, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 21/768 (2006.01); H01L 29/06 (2006.01); H01L 21/683 (2006.01); H01L 31/0392 (2006.01); H01L 27/12 (2006.01); H01L 29/786 (2006.01); H01L 21/48 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76834 (2013.01); H01L 21/76879 (2013.01); H01L 21/76882 (2013.01); H01L 29/78693 (2013.01); H01L 21/4867 (2013.01); H01L 21/6835 (2013.01); H01L 27/1285 (2013.01); H01L 27/1292 (2013.01); H01L 29/0673 (2013.01); H01L 29/0676 (2013.01); H01L 29/78696 (2013.01); H01L 31/0392 (2013.01);
Abstract
A manufacturing process, which we term Self-Aligned Capillarity-Assisted Lithography for manufacturing devices having nano-scale or micro-scale features, such as flexible electronic circuits, is described.