The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2016
Filed:
Jun. 19, 2015
Applicant:
Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, CN;
Inventors:
Aijun Zeng, Shanghai, CN;
Linglin Zhu, Shanghai, CN;
Ruifang Fang, Shanghai, CN;
Huijie Huang, Shanghai, CN;
Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/72 (2006.01); G03B 27/54 (2006.01); G03F 7/20 (2006.01); G02B 3/00 (2006.01); G02B 19/00 (2006.01); G02B 26/10 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7015 (2013.01); G02B 3/0037 (2013.01); G02B 19/0047 (2013.01); G02B 26/101 (2013.01); G03F 7/70066 (2013.01); G03F 7/70075 (2013.01);
Abstract
A lithography illumination system, along the transmission direction of the laser light, successively having a laser light source, a collimating and expanding unit, a pupil shaping unit, a first micro-lens array, a micro-integrator rod array, a micro-scanning slit array, a second micro-lens array, a condenser lens group, a mask, and and a motion control unit for controlling the motion of the micro scanning slit array.