The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2016
Filed:
May. 15, 2012
Applicants:
Tatsuya Sasaki, Tokyo, JP;
Takahito Nishimura, Tokyo, JP;
Inventors:
Tatsuya Sasaki, Tokyo, JP;
Takahito Nishimura, Tokyo, JP;
Assignee:
HOYA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/24 (2012.01); B32B 3/02 (2006.01); G03F 1/38 (2012.01); G03F 1/60 (2012.01); G03F 1/22 (2012.01);
U.S. Cl.
CPC ...
G03F 1/24 (2013.01); B32B 3/02 (2013.01); G03F 1/22 (2013.01); G03F 1/38 (2013.01); G03F 1/60 (2013.01); Y10T 428/24488 (2015.01);
Abstract
A mask blank substrate is provided with a substrate mark comprising an oblique section. The inclination angle of the substrate mark with respect to a main surface is greater than 45° and less than 90° and the distance from the boundary between the main surface and the substrate mark to the outer periphery of the mask blank substrate is less than 1.5 mm.
Sasaki, Tatsuya. (2016). Mask blank substrate, mask blank, reflective mask blank, transfer mask, reflective mask, and methods of manufacturing the same (U.S. Patent No. 9400421). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9400421
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile