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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9399734 B1

PDFFull Text
Date of Patent:
Jul. 26, 2016

Filed:

Apr. 08, 2008

Etching solution

Applicants:

Mitsushi Itano, Settsu, JP;

Shingo Nakamura, Settsu, JP;

Takehiko Kezuka, Settsu, JP;

Daisuke Watanabe, Settsu, JP;

Inventors:

Mitsushi Itano, Settsu, JP;

Shingo Nakamura, Settsu, JP;

Takehiko Kezuka, Settsu, JP;

Daisuke Watanabe, Settsu, JP;

Assignee:

DAIKIN INDUSTRIES, LTD., Osaka, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Jiong-Ping Lu

Int. Cl.
CPC ...
C09K 13/08 (2006.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01); H01L 21/3105 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01); H01L 21/768 (2006.01); C09K 15/00 (2006.01); C09K 13/00 (2006.01); C09K 13/06 (2006.01);
U.S. Cl.
CPC ...
C09K 13/08 (2013.01); C09K 13/00 (2013.01); C09K 13/06 (2013.01); C09K 15/00 (2013.01); H01L 21/02052 (2013.01); H01L 21/02063 (2013.01); H01L 21/30604 (2013.01); H01L 21/31053 (2013.01); H01L 21/31105 (2013.01); H01L 21/31111 (2013.01); H01L 21/31133 (2013.01); H01L 21/32134 (2013.01); H01L 21/76814 (2013.01);
Abstract

An etching solution, a process of producing the same, and an etching process using the same, in which the etching solution includes hydrofluoric acid (a), ammonium fluoride (b), and salt (c) formed between hydrogen fluoride and a base having a boiling point higher than that of ammonia; the concentration of ammonium fluoride (b) is not higher than 8.2 mol/kg, and the total amount of ammonium fluoride (b) and salt (c) formed between hydrogen fluoride and a base having a boiling point higher than that of ammonia is not less than 9.5 mol/kg.

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