The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2016
Filed:
Dec. 02, 2011
Yoshihisa Hayashida, Ichihara, JP;
Takuro Satsuka, Ichihara, JP;
Teruyo Ikeda, Ichihara, JP;
Norio Futaesaku, Ichihara, JP;
Toshifumi Takemori, Chuo-ku, JP;
Yoshihisa Hayashida, Ichihara, JP;
Takuro Satsuka, Ichihara, JP;
Teruyo Ikeda, Ichihara, JP;
Norio Futaesaku, Ichihara, JP;
Toshifumi Takemori, Chuo-ku, JP;
Maruzen Petrochemical Co., Ltd., Tokyo, JP;
Abstract
A resin composition for photoimprinting, a cured product of the resin composition which is excellent in etching and heat resistance, and a pattern forming process using the resin composition are provided. The resin composition contains photocurable monomer (A) containing at least one carbazole compound of formula (I): a photocurable monomer (B) containing at least one compound of the following formulae (II), (III), and (IV): and a photopolymerization initiator (C). The weight ratio of the photocurable monomer (A) to the photocurable monomer (B) is from 30/70 to 87/13.