The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 2016

Filed:

Dec. 17, 2013
Applicant:

Crystal Solar, Inc., Santa Clara, CA (US);

Inventors:

Tirunelveli S. Ravi, San Jose, CA (US);

Ashish Asthana, Fremont, CA (US);

Assignee:

Crystal Solar, Incorporated, Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0224 (2006.01); H01L 31/0236 (2006.01); H01L 31/18 (2006.01); H01L 21/02 (2006.01); H01L 31/068 (2012.01);
U.S. Cl.
CPC ...
H01L 31/022433 (2013.01); H01L 21/0245 (2013.01); H01L 21/02381 (2013.01); H01L 21/02513 (2013.01); H01L 21/02532 (2013.01); H01L 21/02664 (2013.01); H01L 31/02366 (2013.01); H01L 31/022441 (2013.01); H01L 31/0684 (2013.01); H01L 31/1804 (2013.01); Y02E 10/547 (2013.01); Y02P 70/521 (2015.11);
Abstract

Fabrication of a single crystal silicon solar cell with an insitu epitaxially deposited very highly doped p-type silicon back surface field obviates the need for the conventional aluminum screen printing step, thus enabling a thinner silicon solar cell because of no aluminum induced bow in the cell. Furthermore, fabrication of a single crystal silicon solar cell with insitu epitaxial p-n junction formation and very highly doped n-type silicon front surface field completely avoids the conventional dopant diffusion step and one screen printing step, thus enabling a cheaper manufacturing process.


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